发明名称 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. <P>SOLUTION: The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013021320(A) 申请公布日期 2013.01.31
申请号 JP20120147331 申请日期 2012.06.29
申请人 ASML NETHERLANDS BV 发明人 FRANK JOHANNES JACOBUS VAN BOXTEL;GOSEN JEROEN GERARD;KUIPER ANTONY;MARTENS ARJAN HUBRECHT JOSEF ANNA;JEAN-PHILIPPE XAVIER VAN DAMME;PETER SCHOENMAKERS;FRANCISCUS JOANNES ANTHONIUS EVERS;JAAP WILHELMUS PETRUS VAN EMPEL;LEON HUBERT JOSEPH COUMANS;JUSTIN JOHANNES HERMANUS GERRITZEN
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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