| 摘要 |
<p>The invention relates to a microlithographic exposure method, wherein at least one mirror arrangement (200) having a plurality of mirror elements that are adjustable independently of one another for altering an angular distribution of the light reflected by the mirror arrangement, and a polarization manipulator (100, 600, 700, 800) are used in an illumination device (10). A method according to the invention comprises the following steps: determining, for a predefined desired distribution of the intensity and of the polarization state in a pupil plane of the illumination device (10), an orientation of first mirror elements of the mirror arrangement (200), which orientation is suitable for generating said desired distribution, wherein a group composed of one or a plurality of in this case surplus second mirror elements of the mirror arrangement (200) remains; determining an orientation of said second mirror elements which is suitable for at least approximately generating the desired distribution of the intensity; and modifying the determined orientation of the first mirror elements in a manner dependent on the determined orientation of the second mirror elements.</p> |
