摘要 |
<p>A nano graphics and ultra-wideband electromagnetic characteristic measurement system, including a power source (1), a control apparatus (2) and a measurement apparatus (3). The control apparatus (2) is connected to the measurement apparatus (3), the control apparatus (2) and the measurement apparatus (3) are connected to the power source (1) respectively, the measurement apparatus (3) includes an imaging apparatus (31) with an SEM imaging or EBL graphics function, a vacuum chamber (32), a vacuum system (33), a sample table (34) and a magnetic field response characteristic test apparatus (35), wherein the vacuum system (33) is connected to the vacuum chamber (32), the imaging apparatus (31), the sample table (34) and the magnetic field response characteristic test apparatus (35) are all provided inside the vacuum chamber (32), and the imaging apparatus (31) and the magnetic field response characteristic test apparatus (35) are provided opposite the sample table (34).The present system can test and develop nano material and devices and an array sample thereof rapidly and high efficiently and has a wide field of application.</p> |
申请人 |
INSTITUTE OF PHYSICS, CHINESE ACADEMY OF SCIENCES;GERMANTECH CO., LTD;HAN, XIUFENG;MA, QINLI;YU, GUOQIANG;LIU, HOUFANG;YU, TIAN;ZHOU, XIANGQIAN;AI, JINHU;SUN, XIAOYU |
发明人 |
HAN, XIUFENG;MA, QINLI;YU, GUOQIANG;LIU, HOUFANG;YU, TIAN;ZHOU, XIANGQIAN;AI, JINHU;SUN, XIAOYU |