| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a defect characteristic evaluation device capable of precisely evaluating characteristics of a defect on a reflective sample substrate in a non-destructive manner. <P>SOLUTION: The defect characteristic evaluation device includes: a focusing optical system 10 that focuses a beam of coherent light of a wavelength used in an actual exposure onto a defect 12 to be detected on a mask substrate 11, which is a reflective sample substrate, in an identical size to the defect to be detected on the mask substrate 11; a radiation section 16 controlled to focus by the focusing optical system 10 to radiate the coherent light beam on to the mask substrate 11; a two-dimensional detector 13 that two-dimensionally receives a beam of diffraction light radiated by the radiation section 16 through a radiation pattern area 13b; a recording section 17 that records a piece of image information as a reception result by the two-dimensional detector 13; and a calculation section 18 that calculates the reflection amplitude and the phase distribution of the defect 12 to be detected on the basis of the image information recorded by the recording section 17 by repeatedly performing the calculation. <P>COPYRIGHT: (C)2013,JPO&INPIT |
