| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which the likelihood of bubble inclusion is at least reduced. <P>SOLUTION: A fluid handling structure for a lithographic apparatus comprises at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: meniscus pinning features to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array; and at least one gas recovery opening placed radially outside of the plurality of gas supply openings in a linear array. The plurality of gas supply openings at least partly surround the meniscus pinning features, and are placed radially outside of the meniscus pinning features. <P>COPYRIGHT: (C)2013,JPO&INPIT |
