发明名称 SEMICONDUCTOR DEVICE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, ELECTRONIC COMPONENT, CIRCUIT SUBSTRATE, AND ELECTRONIC APPARATUS
摘要 A semiconductor device includes: a semiconductor substrate including a first face and a second face on a side opposite to the first face; an external connection terminal formed on the first face of the semiconductor substrate; a first electrode formed on the first face of the semiconductor substrate and electrically connected to the external connection terminal; an electronic element formed on or above the second face of the semiconductor substrate; a second electrode electrically connected to the electronic element and having a top face and a rear face; a groove portion formed on the second face of the semiconductor substrate and having a bottom face including at least part of the rear face of the second electrode; and a conductive portion formed in the groove portion and electrically connected to the rear face of the second electrode.
申请公布号 US2013026640(A1) 申请公布日期 2013.01.31
申请号 US201213624324 申请日期 2012.09.21
申请人 SEIKO EPSON CORPORATION;SEIKO EPSON CORPORATION 发明人 ITO HARUKI;HASHIMOTO NOBUAKI
分类号 H01L23/528 主分类号 H01L23/528
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