| 摘要 |
<p>This plasma device (10) is provided with a vacuum vessel (1), an arc vaporization source (3), a negative electrode member (4), a shutter (5), and a power source (7). The arc vaporization source (3) is affixed to the side wall of the vacuum vessel (1) facing a substrate (20). The negative electrode member (4) comprises lamellar carbon and is attached to the arc vaporization source (3). The power source (7) applies a negative voltage to the arc vaporization source (3). When arc discharge is started in the vicinity of the arc vaporization source (3), an arc spot moves across the surface of the negative electrode member (4). Afterwards, once the arc spot ceases to move, the shutter (5) is opened, and a carbon thin film is formed on the substrate (20).</p> |
