ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM USING THE SAME, AND METHOD OF FORMING PATTERN

摘要

PROBLEM TO BE SOLVED: To provide an actinic-ray- or radiation-sensitive resin composition that forms an isolated line pattern of favorable shape exhibiting high resolution and excels in other resist performances including dry etching resistance, and to provide an actinic-ray- or radiation-sensitive film using the composition, and a method of forming a pattern.

SOLUTION: An actinic-ray- or radiation-sensitive resin composition includes a compound (P) containing at least one phenolic hydroxyl group and at least one group being a phenolic hydroxyl group whose hydrogen atom is replaced by a group represented by the following general formula (1).

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