发明名称 ILLUMINATION DEVICE, EXPOSURE DEVICE, EXPOSURE METHOD, AND MANUFACTURING METHOD OF DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To achieve a high quality illumination by making it possible to adjust an illumination light, that illuminates an object to be illuminated, to be a uniform illuminance. <P>SOLUTION: An illumination device 10 comprises an illumination light emitting unit 11 and an illumination light guide unit 31. The illumination light guide unit is arranged so that an illumination light is incident on a rod integrator 32, and the illumination light emitting unit illuminates a whole illumination region by making a plurality of branching laser beams Lm1 and Lm2 for illumination incident on the rod integrator 32, and illuminates a part of a region illuminated by the branching laser beams Lm1 and Lm2 for illumination by making a branching laser beam Ls1 for adjusting incident on the rod integrator 32. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013021265(A) 申请公布日期 2013.01.31
申请号 JP20110155696 申请日期 2011.07.14
申请人 NIKON CORP 发明人 FUKUI TATSUO
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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