METHODS AND STRUCTURES FOR RAPID SWITCHING BETWEEN DIFFERENT PROCESS GASES IN INDUCTIVELY-COUPLED PLASMA (ICP) ION SOURCE

摘要

PROBLEM TO BE SOLVED: To provide a method and apparatus for allowing rapid changing of process gases or rapid purging of contamination in a plasma source for a focused ion beam column.

SOLUTION: An openable gas passage provides rapid pump-out of process or bake-out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of a gas inlet, increases gas conductance when opened to pump out a plasma chamber, and closes during operation of the plasma source.

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