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发明名称
PHOTOSENSITIVE MATERIAL AND PROCESS FOR FORMING PATTERN USING THE SAME
摘要
申请公布号
KR910005029(B1)
申请公布日期
1991.07.22
申请号
KR19880016135
申请日期
1988.12.03
申请人
WAKO PURE CHEMICAL IND.CO.,LTD.
发明人
OKAWA KAZUHUMI;ENDO MASAYUKI;NAKAYA MAMORU
分类号
C07C245/14;C07C309/88;C07D295/26;G03F7/016;(IPC1-7):G03F7/004
主分类号
C07C245/14
代理机构
代理人
主权项
地址
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