发明名称 COMPOSITION FOR FORMING THERMOSET FILM HAVING PHOTO-ALIGNMENT PROPERTIES
摘要 There is provided a material that exhibits high solvent resistance after the formation of a cured film, excellent photo-alignment capability relative to a polymerizable liquid crystal, satisfactory heat resistance, and high transparency and moreover, that can be dissolved in a glycol-based solvent, a ketone-based solvent, or a lactic acid ester-based solvent that is applicable to the production of an overcoating of a color filter, during the formation of the cured film. A composition for forming thermoset film having photo-alignment properties, including: a component (A) that is a compound having a photo-aligning group and a hydroxy group; and a component (B) that is a silicon isocyanate compound. A liquid crystal alignment layer formed from the thermoset film forming composition, and an optical device with a retardation layer obtained by use of the thermoset film forming composition.
申请公布号 US2013025502(A1) 申请公布日期 2013.01.31
申请号 US201113639727 申请日期 2011.04.05
申请人 NISSAN CHEMICAL INDUSTRIES, LTD.;HATANAKA TADASHI;KONDO MITSUMASA 发明人 HATANAKA TADASHI;KONDO MITSUMASA
分类号 C09D5/00 主分类号 C09D5/00
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