发明名称 SUBSTRATE PRODUCTION DEVICE
摘要 <p>A substrate is held on a coating stage. A nozzle unit faces the substrate held on the coating stage, and discharges liquid droplets of a thin-film material toward the substrate from a plurality of nozzle holes. The thin-film material is stored in a reservoir tank. A supply system retrieves the thin-film material from the reservoir tank and supplies the same to the nozzle unit. A first heat source heats the reservoir tank. A first temperature sensor measures the temperature of the reservoir tank. A second heat source heats one or more sections of the supply system. A second temperature sensor measures the temperature of the one or more sections of the supply system. On the basis of the measurement results from the first temperature sensor and the second temperature sensor, a temperature control device controls the first heat source and the second heat source in a manner such that the temperature of the thin-film material in the reservoir tank and the temperature of the thin-film material flowing through the supply system fall within a target temperature range.</p>
申请公布号 WO2013015093(A1) 申请公布日期 2013.01.31
申请号 WO2012JP67273 申请日期 2012.07.06
申请人 SUMITOMO HEAVY INDUSTRIES, LTD.;NAKAMORI, YASUHITO;ISO, KEIJI;OKAMOTO, YUJI;SHIRAISHI, TATSURO;ICHIKAWA, EIJI;UTSUMI, KAZUHARU 发明人 NAKAMORI, YASUHITO;ISO, KEIJI;OKAMOTO, YUJI;SHIRAISHI, TATSURO;ICHIKAWA, EIJI;UTSUMI, KAZUHARU
分类号 H05K3/28;B05C5/00;B05C11/10;B05D1/26 主分类号 H05K3/28
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