| 摘要 |
THE INVENTION DESCRIBED AND CLAIMED HEREIN RELATES TO A CHEMICAL VAPOR DEPOSITION PROCESS FOR DEPOSITING A ZINC OXIDE COATING ON A SUBSTRATE BY DELIVERING TWO GASEOUS PRECURSOR STREAMS TO SURFACE OF THE SUBSTRATE, AND MIXING THE GASEOUS PRECURSOR STREAMS AT THE SUBSTRATE SURFACE FOR A TIME SUFFICIENTLY SHORT SO AS TO FORM A ZINC OXIDE COATING AT A DEPOSITION RATE GREATER THAN 5 NM/SECOND. |
