| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a raw material gas supply device that is configured to achieve the simplification and miniaturization of a structure, in which only a raw material gas which is vapor of a liquid raw material gas can be stably supplied to a process chamber while controlling a flow rate at high precision without using a carrier gas. <P>SOLUTION: The raw material gas supply device is constituted in such a manner that the temperature of a source tank 5 storing a liquid raw material gas is held to a set value, further, the supply pressure of the raw material gas G1, which is vapor of the liquid raw material gas derived from an upper space part inside the source tank, to a process chamber 11 is controlled by an automatic pressure regulator 6, and the raw material gas G1 is supplied to the process chamber via an throttle part while holding the pressure of the raw material gas inside the secondary side gas flow passage of the automatic pressure regulator to a desired set pressure. <P>COPYRIGHT: (C)2013,JPO&INPIT |
