NANOIMPRINTING METHOD AND METHOD FOR PRODUCING A MOLD

摘要

Volatilization of a photocuring composition is suppressed while reducing residual gas in a nanoimprinting method. A nanoimprinting method transfers the shapes of protrusions and recesses of a mold onto a photocuring composition layer formed on a substrate, by placing the mold and the photocuring composition layer in close contact. One or both of the mold and the substrate is formed by quartz. The mold and the substrate are placed in close contact with a gas having at least 70% He by volume and a pressure within a range from 10 kPa to 90 kPa interposed therebetween.