发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE
摘要 This method for manufacturing a semiconductor device is provided with: a step wherein a semiconductor element (1), a substrate (2) having Cu as a main element of at least the main surface, and a ZnAl eutectic solder chip (3') smaller than the semiconductor element are prepared; a step wherein the semiconductor element and the substrate are disposed such that respective bonding surfaces face each other, and the ZnAl eutectic solder chip is sandwiched between the substrate and the semiconductor element; a step wherein the ZnAl eutectic solder chip is melted by increasing the temperature, while applying a load (31) to the ZnAl eutectic solder chip sandwiched between the substrate and the semiconductor element, and a ZnAl solder layer (3) is formed; and a step wherein the temperature is reduced, while applying the load to the ZnAl solder layer.
申请公布号 WO2013015402(A1) 申请公布日期 2013.01.31
申请号 WO2012JP69096 申请日期 2012.07.27
申请人 NISSAN MOTOR CO., LTD.;SUMITOMO METAL MINING CO., LTD.;SANKEN ELECTRIC CO., LTD.;FUJI ELECTRIC CO., LTD.;TANIMOTO, SATOSHI;ZUSHI, YUSUKE;MURAKAMI, YOSHINORI;ISEKI, TAKASHI;TAKAMORI, MASATO;SATO, SHINJI;MATSUI, KOHEI 发明人 TANIMOTO, SATOSHI;ZUSHI, YUSUKE;MURAKAMI, YOSHINORI;ISEKI, TAKASHI;TAKAMORI, MASATO;SATO, SHINJI;MATSUI, KOHEI
分类号 H01L21/52;B23K35/28;C22C18/04 主分类号 H01L21/52
代理机构 代理人
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