发明名称 REMOVAL OF METAL IMPURITIES FROM SILICON SURFACES FOR SOLAR CELL AND SEMICONDUCTOR APPLICATIONS
摘要 Removal compositions and processes for removing at least one metal impurity from a substrate (e.g., a silicon-containing substrate) having same thereon. Advantageously, the compositions remove metal impurities, e.g., iron, from silicon-containing substrates used as semiconductor devices and solar cell devices.
申请公布号 WO2012154498(A3) 申请公布日期 2013.01.31
申请号 WO2012US36329 申请日期 2012.05.03
申请人 ADVANCED TECHNOLOGY MATERIALS, INC.;CHEN, LI-MIN (RAYMOND);COOPER, EMANUEL, I.;BARNES, JEFFREY, A.;LIU, JUN;SUN, LAISHENG;BAUM, THOMAS;KORZENSKI, MICHAEL;LOCHTENBERG, BEN;DUBOIS, LAWRENCE 发明人 CHEN, LI-MIN (RAYMOND);COOPER, EMANUEL, I.;BARNES, JEFFREY, A.;LIU, JUN;SUN, LAISHENG;BAUM, THOMAS;KORZENSKI, MICHAEL;LOCHTENBERG, BEN;DUBOIS, LAWRENCE
分类号 H01L31/042;H01L21/306;H01L31/18 主分类号 H01L31/042
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