摘要 |
Removal compositions and processes for removing at least one metal impurity from a substrate (e.g., a silicon-containing substrate) having same thereon. Advantageously, the compositions remove metal impurities, e.g., iron, from silicon-containing substrates used as semiconductor devices and solar cell devices. |
申请人 |
ADVANCED TECHNOLOGY MATERIALS, INC.;CHEN, LI-MIN (RAYMOND);COOPER, EMANUEL, I.;BARNES, JEFFREY, A.;LIU, JUN;SUN, LAISHENG;BAUM, THOMAS;KORZENSKI, MICHAEL;LOCHTENBERG, BEN;DUBOIS, LAWRENCE |
发明人 |
CHEN, LI-MIN (RAYMOND);COOPER, EMANUEL, I.;BARNES, JEFFREY, A.;LIU, JUN;SUN, LAISHENG;BAUM, THOMAS;KORZENSKI, MICHAEL;LOCHTENBERG, BEN;DUBOIS, LAWRENCE |