| 摘要 |
THE PRESENT INVENTION IS DIRECTED TOWARDS A METHOD FOR PATTERNING FIRST AND SECOND SUBSTRATES (12A, 12B) IN A NANOIMPRINT LITHOGRAPHY SYSTEM, THE METHOD INCLUDING, INTER ALIA, CONCURRENTLY POSITIONING THE FIRST AND SECOND SUBSTRATE (12A, 12B) ON A FIRST AND SECOND SUBSTRATE CHUCK (14A, 14B); POSITIONING A NANOIMPRINT MATERIAL ON THE FIRST AND SECOND SUBSTRATE (12A, 12B); REMOVING THE FIRST SUBSTRATE (12A) FROM THE FIRST SUBSTRATE CHUCK (14A) WHILE CONCURRENTLY OBTAINING A SPATIAL RELATIONSHIP BETWEEN THE FIRST SUBSTRATE (12A) AND A NANOIMPRINT MOLD ASSEMBLY AND IMPRINTING A PATTERN IN THE NANOIMPRINT MATERIAL ON THE FIRST SUBSTRATE (12A) WITH THE NANOIMPRINT MOLD ASSEMBLY; AND SEPARATING THE NANOIMPRINT MOLD ASSEMBLY FROM THE NANOIMPRINT MATERIAL ON THE FIRST AND SECOND SUBSTRATE(12A, 12B) , WITH THE FIRST AND SECOND SUBSTRATES BEING SUBJECTED TO SUBSTANTIALLY THE SAME PROCESS CONDITIONS. |
