| 摘要 |
An exposure apparatus (EX) is an apparatus for exposing a substrate (P) by irradiating exposure light (EL) onto the substrate (P) through a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P). A plate member (30) having a liquid repellent flat surface (30A) is replaceably attached to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy. |
