| 摘要 |
<p>PURPOSE: A method for processing a surface of a solar cell substrate is provided to uniformly process a substrate by installing a plurality of dummy substrates outside a processed substrate located on the edge of a loading surface of a tray. CONSTITUTION: A plurality of fine uneven parts are formed on a surface of a processed substrate by a dry etching(S10). The above process is repeated several times. The residue formed on a dummy substrate is removed by the dry etching(S20). The processed substrate is a single crystal or polycrystalline silicon substrate. The dummy substrate is formed along the edge of a loading surface of the tray. [Reference numerals] (AA) Is it executed as a number which is more than a predetermined number?; (BB) No; (CC) Yes; (S10) Step of processing a surface; (S20) Step of washing a dummy substrate</p> |
