发明名称 APPARATUS FOR TREATING SUBSTRATE
摘要 PURPOSE: An apparatus for treating substrate is provided to reduce a use amount of chemical liquid, to reduce operation cost, and to have simply supplying structure of liquid chemical. CONSTITUTION: An apparatus for treating substrate comprises a plurality of transferring roller(200), and a plurality of liquid chemical supply tanks(20). The plurality of transferring rollers rotates to transfer a substrate and wet the bottom of the substrate with the liquid chemical. Each of the liquid chemical supply tanks are arrange in the lower part of the each transferring roller and is spaced to each other. The transferring roller comprises a roller body(230) and a rotary shaft. The roller body accepts the lower side of a substrate and the liquid chemical supplier. The rotary shaft has a first rotary shaft part and a second rotary shaft part.
申请公布号 KR20130011053(A) 申请公布日期 2013.01.30
申请号 KR20110071933 申请日期 2011.07.20
申请人 DMS CO., LTD. 发明人 PARK, HO YOUN
分类号 B05C1/14;B05C1/08;B05C1/16;B05C3/18 主分类号 B05C1/14
代理机构 代理人
主权项
地址
您可能感兴趣的专利