| 摘要 |
<p>Abstract AN APPARATUS FOR THIN-FILM DEPOSITIONAn apparatus 101 for depositing a thin-film onto a surface of a substrate 113 usingprecursor gases G1, G2 is disclosed. The apparatus 101 comprises i) a supporting device 111 for holding the substrate 113; and ii) a spinner 105 positioned adjacent to the supporting device 111. Specifically, the spinner 105 includes a hub 106 for connecting to a motor, and one or more blades 201 connected to the hub 106. In particular, the one ormore blades 201 are operative to rotate around the hub 106 on a plane to drive a fluid flow of the precursor gases G1, G2, so as to distribute the precursor gases G1, G2 across the surface of the substrate 113.[Figure 2]</p> |
