发明名称 |
Method and device for measuring temperature radiation using a pyrometer wherein compensation lamps are used |
摘要 |
Method and apparatus for measuring the radiation originating from one side of a wafer of semiconductor material using a pyrometer, wherein non-blackbody compensation radiation is projected onto that side to compensate for the reflectivity of the wafer of material and wherein the intensity of the non-blackbody compensation radiation is controlled subject to the amount of radiation measured by the pyrometer.
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申请公布号 |
US5271084(A) |
申请公布日期 |
1993.12.14 |
申请号 |
US19920957443 |
申请日期 |
1992.10.06 |
申请人 |
INTERUNIVERSITAIR MICRO ELEKTRONICA CENTRUM VZW |
发明人 |
VANDENABEELE, PETER M. N.;MAEX, KAREN I. J. |
分类号 |
G01J5/00;(IPC1-7):A21B2/00;F26B19/00;G01J5/10 |
主分类号 |
G01J5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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