发明名称 BLACK CURABLE COMPOSITION, LIGHT-SHIELDING COLOR FILTER FOR A SOLID-STATE IMAGING DEVICE AND METHOD OF PRODUCING THE SAME, SOLID-STATE IMAGING DEVICE, WAFER LEVEL LENS, AND CAMERA MODULE
摘要 <p>A black curable composition for forming a light-shielding color filter of solid-state imaging device is provided, which is capable of forming a pattern at low exposure dose even when containing a high concentration of an inorganic pigment, and preventing pattern defects. Also, a black curable composition for a wafer level lens is provided, which is capable of forming a cured film having excellent light shieldability and excellent in co-formability of both a large pattern and a fine pattern. The composition includes: an inorganic pigment; a copolymer containing a monomer having at least one of an amino group and a nitrogen-containing heterocyclic group, a monomer having at least one group of a carboxyl group, a phosphate group and a sulfonate group, and a macromonomer having a weight average molecular weight from 1,000 to 50,000; a polymerization initiator; a polymerizable compound; and an alkali-soluble resin having an unsaturated double bond.</p>
申请公布号 EP2550554(A1) 申请公布日期 2013.01.30
申请号 EP20110759650 申请日期 2011.03.24
申请人 FUJIFILM CORPORATION 发明人 KANEKO, YUSHI;KUBOTA, MAKOTO;SHIMADA, KAZUTO
分类号 G02B5/00;C08F2/44;G02B1/04;G02B3/00;G03F7/004;G03F7/027;G03F7/029;G03F7/031;G03F7/038;H01L27/14 主分类号 G02B5/00
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