| 摘要 |
OF THE DISCLOSUREDevice and method for drying a photomaskAn object of the present invention is a device for drying a photomask comprising:a sealed chamber (2) containing at least one photomask (13),a pumping unit (3) to set up and maintain vacuum within said chamber (2),a support (12) for the photomask (13) placed within said chamber (2),infrared radiation means (6) placed within said chamber (2),a system (10) for injecting gas into said chamber (2).characterized in that the infrared radiation means comprise a plurality of infrared radiation sources (6) distributed in a plane parallel to the plane of the photomask (13) in such a way that the distance from the photomask (13) to the IR radiation means is given by the relationship: D =1.5 x d wherein D is the distance between the plane containing the infrared radiation sources and the photomask and d is the distance between the center points of two neighboring infrared radiation sources (6), and in that the gas-injection system (10) comprises a plurality of gas injectors (30) distributed in a plane parallel to the plane of the photomask (13) in such a way that the injectors (30) follow a 90° rotational invariance about the center point of the photomask (13)..Figure to be published : fig.1 |
