发明名称 |
A METHOD TO PROTECT MAGNETIC BITS DURING PLANARIZATION |
摘要 |
<p>The embodiments disclose a method to protect magnetic bits during carbon field planarization, including depositing a stop layer upon magnetic bits and magnetic film of a patterned stack, depositing a carbon fill layer on the stop layer and using the stop layer during planarization and etch-back of the carbon field to protect the patterned stack magnetic bits during the carbon field planarization. Figure 1</p> |
申请公布号 |
SG186562(A1) |
申请公布日期 |
2013.01.30 |
申请号 |
SG20120042974 |
申请日期 |
2012.06.11 |
申请人 |
SEAGATE TECHNOLOGY LLC |
发明人 |
KUO, DAVID S.;FELDBAUM, MICHAEL R.;RAJORA, PARITOSH;LAM, HIEU |
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