| 摘要 |
A measurement apparatus includes a projection unit configured to project pattern light onto an object to be measured, an imaging unit configured to capture an image of the object to be measured on which the pattern light is projected to acquire a captured image of the object to be measured, a measurement unit configured to measure a position and/or orientation of the object to be measured on the basis of the captured image, a position and orientation of the projection unit, and a position and orientation of the imaging unit, a setting unit configured to set identification resolution of the pattern light using a range of variation in the position and/or orientation of the object to be measured; and a change unit configured to change a pattern shape of the pattern light in accordance with the identification resolution. |
