CONTROLLING METHOD OF EXPOSURE APPARATUS

摘要

PURPOSE: A controlling method of a light-exposure apparatus is provided to reduce time consumption for re-setting by correcting the light shaft of an exposure beam by internal control of an exposure beam generator. CONSTITUTION: A light-exposure apparatus comprises an exposure-beam generator which comprises a prism or a bend mirror, and a vacuum chamber. Light generated from the exposure-beam generator passes through the vacuum chamber. A controlling method of the light-exposure apparatus comprises: a step of generating the exposure-beam from the exposure-beam generator; a step of measuring leaning of a light shaft in the vacuum chamber; and a step of adjusting the light shaft by controlling the prism or bend mirror in the exposure-beam generator. [Reference numerals] (AA) Leaning; (BB) No leaning; (S10) Acquiring laser energy; (S100) OSC voltage readjustment(355nm); (S110) AMP voltage readjustment(355nm); (S120) Exposure preparation completion; (S20) OSC voltage adjustment(1064nm); (S30) AMP voltage adjustment(355nm); (S40) SHG crystal adjustment; (S50) THG crystal adjustment; (S60) Delay adjustment; (S70,S90) Measuring the leaning of the diameter of laser beam; (S80) Adjusting the angle of a prism