发明名称 |
Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing method |
摘要 |
A patterned beam of radiation is projected onto a substrate. A reflective optical element is used to help form the radiation beam from radiation emitted from a plasma region of a plasma source. In the plasma source, a plasma current is generated in the plasma region. To reduce damage to the reflective optical element, a magnetic field is applied in the plasma region with at least a component directed along a direction of the plasma current. This axial magnetic field helps limit the collapse of the Z-pinch region of the plasma. By limiting the collapse, the number of fast ions emitted may be reduced.
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申请公布号 |
US8362444(B2) |
申请公布日期 |
2013.01.29 |
申请号 |
US20100907135 |
申请日期 |
2010.10.19 |
申请人 |
ASML NETHERLANDS B.V.;IVANOV VLADIMIR VITALEVITCH;BANINE VADIM YEVGENYEVICH;KOSHELEV KONSTANTIN NIKOLAEVITCH |
发明人 |
IVANOV VLADIMIR VITALEVITCH;BANINE VADIM YEVGENYEVICH;KOSHELEV KONSTANTIN NIKOLAEVITCH |
分类号 |
G21K5/00 |
主分类号 |
G21K5/00 |
代理机构 |
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代理人 |
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