发明名称 Measurement apparatus and method of manufacturing optical system
摘要 The present invention provides a measurement apparatus which measures a wavefront of light traveling from a member to be measured, the apparatus including a first reference surface, a second reference surface configured to function as a reference surface for the first reference surface, an optical system configured to form a first interference pattern of light traveling from the member to be measured and light traveling from the first reference surface, and a second interference pattern of light traveling from the first reference surface and light traveling from the second reference surface, a detection unit configured to detect the first interference pattern and the second interference pattern, respectively, and a calculation unit configured to calculate a wavefront of light traveling from the member to be measured based on the first interference pattern and the second interference pattern detected by the detection unit.
申请公布号 US8363227(B2) 申请公布日期 2013.01.29
申请号 US20100836218 申请日期 2010.07.14
申请人 CANON KABUSHIKI KAISHA;AOKI EIJI 发明人 AOKI EIJI
分类号 G01B11/02 主分类号 G01B11/02
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