发明名称 Radiation-sensitive composition and process for producing low-molecular compound for use therein
摘要 A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.
申请公布号 US8361691(B2) 申请公布日期 2013.01.29
申请号 US20070439860 申请日期 2007.08.28
申请人 JSR CORPORATION;MATSUMURA NOBUJI;SHIMIZU DAISUKE;KAI TOSHIYUKI 发明人 MATSUMURA NOBUJI;SHIMIZU DAISUKE;KAI TOSHIYUKI
分类号 G03F7/004;C07C69/96;C07C309/12;C07C381/12;G03F7/039;H01L21/027 主分类号 G03F7/004
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