发明名称 |
Radiation-sensitive composition and process for producing low-molecular compound for use therein |
摘要 |
A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.
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申请公布号 |
US8361691(B2) |
申请公布日期 |
2013.01.29 |
申请号 |
US20070439860 |
申请日期 |
2007.08.28 |
申请人 |
JSR CORPORATION;MATSUMURA NOBUJI;SHIMIZU DAISUKE;KAI TOSHIYUKI |
发明人 |
MATSUMURA NOBUJI;SHIMIZU DAISUKE;KAI TOSHIYUKI |
分类号 |
G03F7/004;C07C69/96;C07C309/12;C07C381/12;G03F7/039;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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