发明名称 |
Substrate processing apparatus capable of cleaning inside thereof and cleaning control apparatus for controlling cleaning process of substrate processing apparatus |
摘要 |
A cleaning control apparatus capable of performing a cleaning process efficiently regardless of qualities and thicknesses of films formed in a process tube and a gas supply nozzle. The cleaning control apparatus employs cleaning request signal output units configured to output cleaning request signals requesting cleaning processes of a silicon-containing gas supply system and nitriding source gas supply system when accumulated amounts of the molecules of the silicon-containing gas and the nitriding source gas exceeds preset values.
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申请公布号 |
US8361902(B2) |
申请公布日期 |
2013.01.29 |
申请号 |
US201213541814 |
申请日期 |
2012.07.05 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC.;KATO TOMOHIDE |
发明人 |
KATO TOMOHIDE |
分类号 |
H01L21/28 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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