发明名称 Substrate pick
摘要 Disclosed is a method for handling devices, such as reticles, in a semiconductor manufacturing environment. In one illustrative embodiment, the method includes: providing a pick comprised of a plurality of spaced-apart grippers with a pivot point between the gripper about which point the spaced-apart grippers are configured to pivot; creating a vacuum in a body proximate to the pivot point, wherein the vacuum is configured to draw particles generated in the area of the pivot into the body; and generating a magnetic force between magnets, wherein the magnetic force drives at least one gripper toward another gripper to grasp a semiconducting substrate or a reticle between the grippers.
申请公布号 US8360491(B2) 申请公布日期 2013.01.29
申请号 US20100837632 申请日期 2010.07.16
申请人 MICRON TECHNOLOGY, INC.;CHALOM MIKE;OLIVER JON;GABBY TY;STRODTBECK TIMOTHY A. 发明人 CHALOM MIKE;OLIVER JON;GABBY TY;STRODTBECK TIMOTHY A.
分类号 B25J1/00;B66C1/04 主分类号 B25J1/00
代理机构 代理人
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