发明名称 PLATING APPARATUS AND PLATING METHOD
摘要 PURPOSE: A plating apparatus and plating method are provided to remove a separate power device to rotate a substrate holder by rotating a substrate holder using a substrate holder transfer part for transferring a substrate holder to a plating part. CONSTITUTION: A plating apparatus includes a plating part(130), a substrate holder, a substrate holder transferring part(140), a stoker(150) and a stoker configuring part. The plating part plates a substrate. The substrate holder holds a substrate. The substrate transferring part holds and transfers the substrate holder. The stoker stores the substrate holder. The stoker configuring part stores the stoker inside. The stoker includes a traveling mechanism for moving the stoker to inside of the stoker configuring part or from the stoker configuring part. The traveling mechanism includes a castor for moving or separating the stoker from the plating apparatus.
申请公布号 KR20130010825(A) 申请公布日期 2013.01.29
申请号 KR20120025532 申请日期 2012.03.13
申请人 EBARA CORPORATION 发明人 MINAMI YOSHIO
分类号 C25D17/00;C25D7/12 主分类号 C25D17/00
代理机构 代理人
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