DEPOSITION APPARATUS FOR THIN FILM AND DEPOSITION METHOD FOR THIN FILM USING THE SAME

摘要

PURPOSE: A thin film depositing apparatus and a thin film depositing method using the same are provided to improve thermal uniformity of a substrate by heating a substrate support member to increase a temperature of a head part. CONSTITUTION: A processing chamber provides a process space to deposit a thin film on a substrate. A susceptor(120) supports the substrate in a thin film deposition process. A gas spray unit sprays source gas to the substrate for a deposition process. A plurality of substrate support members(140) passes through the susceptor. The substrate support member includes a support stand(142) inserted into an insertion hole and a head part(144) combined with the upper side of the support stand.