发明名称 Method for checking and fixing double-patterning layout
摘要 A method and system checks a double patterning layout and outputs a representation of G0-rule violations and critical G0-spaces. The method includes receiving layout data having patterns, determining whether each distance between adjacent pattern elements is a G0-space, find all G0-space forming a G0-rule violation, finding all G0-space that are critical G0-spaces, and outputting a representation of G0-rule violations and critical G0-spaces to an output device. By resolving G0-rule violations and critical G0-spaces, a design checker can effectively generate a double patterning technology (DPT) compliant layout.
申请公布号 US8365102(B2) 申请公布日期 2013.01.29
申请号 US20100788789 申请日期 2010.05.27
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.;WANG DIO;HSIEH KEN-HSIEN;CHEN HUANG-YU;TIEN LI-CHUN;LIU RU-GUN;LU LEE-CHUNG 发明人 WANG DIO;HSIEH KEN-HSIEN;CHEN HUANG-YU;TIEN LI-CHUN;LIU RU-GUN;LU LEE-CHUNG
分类号 G06F17/50 主分类号 G06F17/50
代理机构 代理人
主权项
地址