PHOTOCURABLE RESIN COMPOSITION

摘要

PURPOSE: A photocurable resin composition is provided to prevent an expensive base plate from being fouled or damaged by excellent releasing performance with a base plate stamp when applied to an imprint lithography mold. CONSTITUTION: A photocurable resin composition comprises: polyaliphatic aromatic silsesquioxane which contains an ethylenically unsaturated group indicated in chemical formula 1, and a fluorine group; a reactive monomer which contains one or more unsaturated groups in one molecule; an organic silane-based compound, and a photoinitiator. In chemical formula 1, each of R^1-R^4 is hydrogen or a C1-20 alkyl group or alkoxy group which is substituted or unsubstituted by fluorine, C6-20 aromatic group or a C2-20 ethylenic unsaturated group, n is an integer from 1-30, and each of R^5-R^8 is hydrogen, a C1-20 alkyl group or alkoxy group.