| 摘要 |
PURPOSE: A chemical vapor deposition apparatus is provided to improve durability of a liner by preventing impact which can be created according to opening and shutting of a lead to be delivered to the liner. CONSTITUTION: A lead(120) is installed at the upper end of a chamber(110). One end of the chamber is opened. The lead is opened and shut. A shower head(130) is installed at one side of the lead facing the inside the chamber. The shower head spreads gas in the inner side of the chamber. A susceptor(140) is arranged inside the chamber to be faced with the shower head. The susceptor supports a substrate. The susceptor comprises a rotary plate(141) and a supporting body(142) supporting the rotary plate. A liner(160) is installed between the inner sidewall of the chamber and outer sidewall of the susceptor. |
