| 摘要 |
An exposure apparatus (1) configured to expose a pattern of a reticle (20) via a liquid (LW) filled between a final lens of a projection optical system (30) and a substrate (40) includes a stage (45) configured to drive the substrate, a shield (81) configured to enclose the stage so as to form a shield space (SS) around the stage, the shield having an opening for an import or an export of the substrate, and a unit, such as a load lock chamber (83), configured to prevent a vapor of the liquid to going out of the shield space and to reduce an outflow amount of the vapor.
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