发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
|
申请公布号 |
US8363208(B2) |
申请公布日期 |
2013.01.29 |
申请号 |
US20100700602 |
申请日期 |
2010.02.04 |
申请人 |
ASML NETHERLANDS B.V.;DE SMIT JOANNES THEODOOR;BANINE VADIM YEVGENYEVICH;BISSCHOPS THEODORUS HUBERTUS JOSEPHUS;MODDERMAN THEODORUS MARINUS;DIERICHS MARCEL MATHIJS THEODORE MARIE |
发明人 |
DE SMIT JOANNES THEODOOR;BANINE VADIM YEVGENYEVICH;BISSCHOPS THEODORUS HUBERTUS JOSEPHUS;MODDERMAN THEODORUS MARINUS;DIERICHS MARCEL MATHIJS THEODORE MARIE |
分类号 |
G03B27/52;G03F7/20;H01L21/027 |
主分类号 |
G03B27/52 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|