发明名称 Polymer resin compounds and photoresist composition including new polymer resin compounds
摘要 The present invention relates to a polymer resin compound including a new polycyclic compound, and a photosensitive resin composition including the polymer resin compound as an effective binder matrix. In particular, the photosensitive resin composition according to the present invention uses a polymer resin compound, which includes a compound having double cyclic structure in one molecule as a monomer, as a binder matrix. Accordingly, the photosensitive resin composition has an excellent photosensitivity and an excellent developing property, and has a low distortion property during plastic processing. For this reason, the photosensitive resin composition has an advantage of curing various transparent photosensitive materials used to manufacture a color filter of a liquid crystal display, for example, a column spacer, an overcoat, a passivation material, and the like.
申请公布号 US8361696(B2) 申请公布日期 2013.01.29
申请号 US20080523107 申请日期 2008.01.15
申请人 LG CHEM, LTD.;LEE KEON-WOO;KIM SUNG-HYUN;CHO CHANG-HO;OH DONG-KUNG;LIM MIN-YOUNG;YOO JI-HEUM;KWAK SANG-KYU 发明人 LEE KEON-WOO;KIM SUNG-HYUN;CHO CHANG-HO;OH DONG-KUNG;LIM MIN-YOUNG;YOO JI-HEUM;KWAK SANG-KYU
分类号 C08F2/50;C08J3/28;G03F7/004;G03F7/027;G03F7/028;G03F7/032;G03F7/038 主分类号 C08F2/50
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