发明名称 |
Multiple-beam system for high-speed electron-beam inspection |
摘要 |
One embodiment disclosed relates to a multiple-beamlet electron beam imaging apparatus for imaging a surface of a target substrate. A beam splitter lens array is configured to split the illumination beam to form a primary beamlet array, and a scanning system is configured to scan the primary beamlet array over an area of the surface of the target substrate. In addition, a detection system configured to detect individual secondary electron beamlets. Another embodiment disclosed relates to a method of imaging a surface of a target substrate using a multiple-beamlet electron beam column. Other features and embodiments are also disclosed.
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申请公布号 |
US8362425(B2) |
申请公布日期 |
2013.01.29 |
申请号 |
US201113095585 |
申请日期 |
2011.04.27 |
申请人 |
KLA-TENCOR CORPORATION;HAN LIQUN;JIANG XINRONG;GREENE JOHN D. |
发明人 |
HAN LIQUN;JIANG XINRONG;GREENE JOHN D. |
分类号 |
G01N23/04;G01N23/00 |
主分类号 |
G01N23/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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