发明名称 APPARATUSFOR POLISHING SUBSTRATES
摘要 <p>PURPOSE: A cutting apparatus and a substrate cutting method using the same are provided to shorten the time taken for a polishing process by implementing a polishing process during movement along a transferring rail. CONSTITUTION: A stage(600) moves according to a transfer rail(500). A polishing unit(700) is installed on the route of the transfer rail. The polishing unit polishes an edge of the substrate settled on the stage. The stage comprises a support plate and a rotating unit. The support plate is formed with an inserting hole in the central part. The rotating unit moves the substrate settled on the support plate in rotation vertically.</p>
申请公布号 KR101226953(B1) 申请公布日期 2013.01.28
申请号 KR20080118362 申请日期 2008.11.26
申请人 发明人
分类号 C03B33/02;G02F1/13;H01L21/302;H01L21/78 主分类号 C03B33/02
代理机构 代理人
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