| 摘要 |
PURPOSE: A substrate cleaning device and a method thereof, and a substrate cleaning facility using the same are provided to polish and clean a substrate by a uniform pressurizing force, thereby uniformly cleaning the substrate. CONSTITUTION: A first transfer unit(220) comprises a first transferring belt(221), a first transferring roller(225), and a first supporting block(231). A second transferring unit(240) comprises a second transferring belt(241), a second transferring roller(245), and a second supporting block(251). A cleaning unit comprises an upper cleaning unit(270) and a lower cleaning unit(280). The upper cleaning unit eliminates foreign materials from the upper surface of a substrate. The lower cleaning unit eliminates foreign materials from the lower surface of the substrate. |
