| 摘要 |
PURPOSE: A treatment apparatus of harmful gas and a treatment method of the same are provided to increase the reaction time of plasma and harmful gas by inducing harmful gas to flow to the opposite direction of plasma. CONSTITUTION: A treatment apparatus of harmful gas includes a plasma generating unit(100) and a counter-flow chamber(200). The plasma generating unit generates plasma by applying a voltage to a part between a cathode and an anode. The counter-flow chamber is connected to the plasma generating unit. The counter-flow chamber injects harmful gas to the opposite direction of plasma. The counter-flow chamber exhausts plasma treated harmful gas to the external side of the chamber. [Reference numerals] (AA,BB) Harmful gas |
