| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having a high resolution and favorable roughness characteristics and pattern shape in lithography using an electron beam, X ray, or EUV light as an exposure light source. <P>SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes: a repeating unit (A) including an ionic structure part that is decomposed by the application of an actinic ray or radiation to generate acid anion; a repeating unit (B) having a proton acceptor group; and a repeating unit (C) having a group that is decomposed by an action of an acid to generate an alkali soluble group. The actinic ray-sensitive or radiation-sensitive resin composition includes, as the repeating unit (A), a resin (P) having at least one repeating unit represented by the following general formulas (I) to (III). <P>COPYRIGHT: (C)2013,JPO&INPIT |
