THIN FILM MANUFACTURING APPARATUS, THIN FILM MANUFACTURING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

In an apparatus for manufacturing a ceramic thin film by employing a thermal CVD method, an internal jig, which is provided with a heat radiation material film on the surface, is provided at a position that faces a substrate (S) on which the film is to be formed. The thin film and a semiconductor device are manufactured using such apparatus.