发明名称 METHOD OF STABILIZING HYDROGENATED AMORPHOUS SILICON AND AMORPHOUS HYDROGENATED SILICON ALLOYS
摘要 A method of forming a semiconductor material of a photovoltaic device that includes providing a surface of a hydrogenated amorphous silicon containing material, and annealing the hydrogenated amorphous silicon containing material in a deuterium containing atmosphere. Deuterium from the deuterium-containing atmosphere is introduced to the lattice of the hydrogenated amorphous silicon containing material through the surface of the hydrogenated amorphous silicon containing material. In some embodiments, the deuterium that is introduced to the lattice of the hydrogenated amorphous silicon containing material increases the stability of the hydrogenated amorphous silicon containing material.
申请公布号 US2013019944(A1) 申请公布日期 2013.01.24
申请号 US201113188214 申请日期 2011.07.21
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION;HEKMATSHOAR-TABARI BAHMAN;HOPSTAKEN MARINUS;PARK DAE-GYU;SADANA DEVENDRA K.;SHAHIDI GHAVAM G.;SHAHRJERDI DAVOOD 发明人 HEKMATSHOAR-TABARI BAHMAN;HOPSTAKEN MARINUS;PARK DAE-GYU;SADANA DEVENDRA K.;SHAHIDI GHAVAM G.;SHAHRJERDI DAVOOD
分类号 H01L31/0376 主分类号 H01L31/0376
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