摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for depositing a buffer layer using a CBD method, by which a buffer layer having good adhesion can be manufactured with high productivity while suppressing the formation of a particulate solid matter. <P>SOLUTION: A photoelectric conversion element 1 (1') includes a lower electrode layer 20, a photoelectric conversion semiconductor layer 30 mainly comprising a compound semiconductor, a buffer layer 40, and a translucent conductive layer 50 which are laminated in order on a substrate 10. A method for manufacturing the buffer layer 40 in the photoelectric conversion element 1 (1') includes: a step (A) of applying a precursor layer 40R containing a metal salt hydrate on the photoelectric conversion semiconductor layer 30 to form a film; a step (B) of performing insolubilization treatment to the precursor layer 40R; and a step (C) of immersing a surface at least on a side of a precursor layer 40P of the substrate 10 having been subjected to the insolubilization treatment into an alkaline reaction liquid L1 (L2) containing a sulfur source to form the buffer layer 40 by means of a chemical bath deposition process. <P>COPYRIGHT: (C)2013,JPO&INPIT |